A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (2024)

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Micromachines

Volume 15

Issue 6

10.3390/mi15060802

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Article

by

Jonathan Kottmeier

A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (5)Jonathan Kottmeier

1,*A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (6),

Maike S. Wullenweber

A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (7)Maike S. Wullenweber

2,3A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (8),

Ingo Kampen

2,3,

Arno Kwade

2,3A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (11) and

Andreas Dietzel

1,2A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (13)

1

Institute of Microtechnology, TU Braunschweig, 38124 Braunschweig, Germany

2

Center of Pharmaceutical Engineering (PVZ), TU Braunschweig, 38106 Braunschweig, Germany

3

Institute for Particle Technology, TU Braunschweig, 38104 Braunschweig, Germany

*

Author to whom correspondence should be addressed.

Micromachines 2024, 15(6), 802; https://doi.org/10.3390/mi15060802 (registeringDOI)

Submission received: 19 April 2024 / Revised: 7 June 2024 / Accepted: 14 June 2024 / Published: 18 June 2024

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Abstract

Future industrial applications of microparticle fractionation with deterministic lateral displacement (DLD) devices are hindered by exceedingly low throughput rates. To enable the necessary high-volume flows, high flow velocities as well as high aspect ratios in DLD devices have to be investigated. However, no experimental studies have yet been conducted on the fractionation of bi-disperse suspensions containing particles below 10 µm with DLD at a Reynolds number (Re) above 60. Furthermore, devices with an aspect ratio of more than 4:1, which require advanced microfabrication, are not known in the DLD literature. Therefore, we developed a suitable process with deep reactive ion etching of silicon and anodic bonding of a glass lid to create pressure-resistant arrays. With a depth of 120 µm and a gap of 23 µm between posts, a high aspect ratio of 6:1 was realized, and devices were investigated using simulations and fractionation experiments. With the two-segmented array of 3° and 7° row shifts, critical diameters of 8 µm and 12 µm were calculated for low Re conditions, but it was already known that vortices behind the posts can shift these values to lower critical diameters. Suspensions with polystyrene particles in different combinations were injected with an overall flow rate of up to 15 mL/min, corresponding to Re values of up to 90. Suspensions containing particle combinations of 2 µm with 10 µm as well as 5 µm with 10 µm were successfully fractionated, even at the highest flow rate. Under these conditions, a slight widening of the displacement position was observed, but there was no further reduction in the critical size as it was for Re = 60. With an unprecedented fractionation throughput of nearly 1 L per hour, entirely new applications are being developed for chemical, pharmaceutical, and recycling technologies.

Keywords: deterministic lateral displacement (DLD); microfluidics; high throughput; high aspect ratio; size-dependent fractionation

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MDPI and ACS Style

Kottmeier, J.; Wullenweber, M.S.; Kampen, I.; Kwade, A.; Dietzel, A. A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation. Micromachines 2024, 15, 802. https://doi.org/10.3390/mi15060802

AMA Style

Kottmeier J, Wullenweber MS, Kampen I, Kwade A, Dietzel A. A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation. Micromachines. 2024; 15(6):802. https://doi.org/10.3390/mi15060802

Chicago/Turabian Style

Kottmeier, Jonathan, Maike S. Wullenweber, Ingo Kampen, Arno Kwade, and Andreas Dietzel. 2024. "A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation" Micromachines 15, no. 6: 802. https://doi.org/10.3390/mi15060802

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

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MDPI and ACS Style

Kottmeier, J.; Wullenweber, M.S.; Kampen, I.; Kwade, A.; Dietzel, A. A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation. Micromachines 2024, 15, 802. https://doi.org/10.3390/mi15060802

AMA Style

Kottmeier J, Wullenweber MS, Kampen I, Kwade A, Dietzel A. A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation. Micromachines. 2024; 15(6):802. https://doi.org/10.3390/mi15060802

Chicago/Turabian Style

Kottmeier, Jonathan, Maike S. Wullenweber, Ingo Kampen, Arno Kwade, and Andreas Dietzel. 2024. "A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation" Micromachines 15, no. 6: 802. https://doi.org/10.3390/mi15060802

Note that from the first issue of 2016, this journal uses article numbers instead of page numbers. See further details here.

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A High-Aspect-Ratio Deterministic Lateral Displacement Array for High-Throughput Fractionation (14)

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